Gluch

Linkedin ResearchGate

Jürgen Gluch

former Senior scientist

Stay period:Jan. 1, 2012 - Dec. 30, 2015
Now: Employee at Robert Bosch Semiconductor Manufacturing
Link to external profile: https://www.bosch.de/unser-unternehmen/bosch-in-deutschland/dresden/

Jürgen studied Materials Science at the TU Dresden, Germany, from 1997 to 2004. He got his diploma on the "methodical development of and material analysis with a multi-functional Kossel-EBSD-SEM system", while acquiring an additional certificate in regional study "East Asia/Japan".

After graduation he moved to Tokyo, Japan and worked as costumer support engineer for automotive supplier from 2004 to 2007.

In 2007 Jürgen returned to Germany for his PhD thesis. He went to the Leibniz Institute IFW in Dresden and worked in the group of Prof. Eckert. There he worked in close cooperation with Qimonda AG and TU Dresden on the mircrostructural characterization of Yttrium stabilized Hafnium oxide high-k thin films for DRAM applications. He defended his thesis in October 2011.

In February 2012 he joined the ENano group coordinated by our chair as a Post-Doc. Jürgen plans to work in cooperation with Prof. Kieback and Prof. Zschech on X-ray and electron tomography for the characterization of morphology and cycle stability of iron/iron oxide nano powder compacts.




Gluch

Linkedin ResearchGate

Jürgen Gluch

former Senior scientist

Stay period:Jan. 1, 2012 - Dec. 30, 2015
Now: Employee at Robert Bosch Semiconductor Manufacturing
Link to external profile: https://www.bosch.de/unser-unternehmen/bosch-in-deutschland/dresden/

Jürgen studied Materials Science at the TU Dresden, Germany, from 1997 to 2004. He got his diploma on the "methodical development of and material analysis with a multi-functional Kossel-EBSD-SEM system", while acquiring an additional certificate in regional study "East Asia/Japan".

After graduation he moved to Tokyo, Japan and worked as costumer support engineer for automotive supplier from 2004 to 2007.

In 2007 Jürgen returned to Germany for his PhD thesis. He went to the Leibniz Institute IFW in Dresden and worked in the group of Prof. Eckert. There he worked in close cooperation with Qimonda AG and TU Dresden on the mircrostructural characterization of Yttrium stabilized Hafnium oxide high-k thin films for DRAM applications. He defended his thesis in October 2011.

In February 2012 he joined the ENano group coordinated by our chair as a Post-Doc. Jürgen plans to work in cooperation with Prof. Kieback and Prof. Zschech on X-ray and electron tomography for the characterization of morphology and cycle stability of iron/iron oxide nano powder compacts.