Due to ease of fabrication of arbitrary structures with high specificity as well as the “direct” writing of the desired pattern on the substrate, electron-beam lithography (EBL) has attracted significant attention and the micro-/nanopatterned surfaces generated by this technique are excellent candidates to be integrated into solid-state devices such as biosensors. Compared to traditional photolithography, EBL does not suffer from the drawbacks of conventional methods such as roughness generation during the etching step, long processing times, or resist/film adhesion and can achieve much better resolutions due to an extremely short wavelength of the electron beam (0.2-0.5 Å). This method is a versatile and straightforward tool to fabricate nanoscale features that meet the requirements of nanophotonic studies.
Due to ease of fabrication of arbitrary structures with high specificity as well as the “direct” writing of the desired pattern on the substrate, electron-beam lithography (EBL) has attracted significant attention and the micro-/nanopatterned surfaces generated by this technique are excellent candidates to be integrated into solid-state devices such as biosensors. Compared to traditional photolithography, EBL does not suffer from the drawbacks of conventional methods such as roughness generation during the etching step, long processing times, or resist/film adhesion and can achieve much better resolutions due to an extremely short wavelength of the electron beam (0.2-0.5 Å). This method is a versatile and straightforward tool to fabricate nanoscale features that meet the requirements of nanophotonic studies.